Pengaruh Rapat Arus (Current Density) terhadap Tebal Deposit Nikel dalam Proses Electroplating Pada Substrate Poly-vinyl Chloride
| Main Author: | MiftakhulHuda |
|---|---|
| Format: | Thesis NonPeerReviewed |
| Terbitan: |
, 2008
|
| Subjects: | |
| Online Access: |
http://repository.ub.ac.id/139514/ |