Low pressure CVD of polycrystalline silicon: reaction kinetics and reactor modelling
| Format: | Book |
|---|---|
| Terbitan: |
, 2000
|
| Subjects: | |
| Online Access: |
http://jatinangor.lib.itb.ac.id/index.php/bibliografi/detail/3165 |
Daftar Isi:
- 286 hlm.; gamb., tab., 24 cm.