Effect of Chlorine Plasma Treatment on Electronic Properties of GIZO Thin Film Grown on SiO2/Si Substrate
Main Authors: | Tahir, Dahlang; Department of Physics, Hasanuddin University, Oh, Suhk Kun; Department of Physics, Chungbuk National University, Kang, Hee Jae; Department of Physics, Chungbuk National University, Heo, Sung; Analytical Engineering Center, Samsung Advanced Institute of Technology, Chung, Jae Gwan; Analytical Engineering Center, Samsung Advanced Institute of Technology, Lee, Jae Cheol; Analytical Engineering Center, Samsung Advanced Institute of Technology |
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Format: | Article info application/pdf eJournal |
Bahasa: | eng |
Terbitan: |
ITB Journal Publisher, LPPM ITB
, 2013
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Subjects: | |
Online Access: |
http://journals.itb.ac.id/index.php/jmfs/article/view/804 http://journals.itb.ac.id/index.php/jmfs/article/view/804/485 |
Internet
http://journals.itb.ac.id/index.php/jmfs/article/view/804http://journals.itb.ac.id/index.php/jmfs/article/view/804/485
Lokasi
Koleksi | Journal of Mathematical and Fundamental Sciences |
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Gedung | Perpustakaan Institut Teknologi Bandung |
Institusi | Institut Teknologi Bandung |
Kota | KOTA BANDUNG |
Provinsi | JAWA BARAT |
Kontak | Butuh informasi lebih lanjut? Hubungi pustakawan institusi ini. |