Modifikasi Permukaan Lapis Tipis Semikonduktor Ti02 Bersubstrat Grafit dengan Elektrodeposisi Cu

Main Author: Perpustakaan UGM, i-lib
Format: Article NonPeerReviewed
Terbitan: [Yogyakarta] : Universitas Gadjah Mada , 2008
Subjects:
Online Access: https://repository.ugm.ac.id/27922/
http://i-lib.ugm.ac.id/jurnal/download.php?dataId=10985
Daftar Isi:
  • ABSTRACT Surface modificationof graphitefT702has been done by mean of Cu electrodeposition. This research aims to study the effect of Cu electrodepositionon photocatalyticenhancing of Ti02.Electrodepositionhas been done using CUS04 0,4 M as the electrolyte at controlled current. The XRD pattern of modified Ti02 thin film on graphite substrate exhibited new peaks at 29= 43-440and 29= 50-510that have been identified as Cu with crystal cubic system, face-centered crystal lattice and crystallite size of 26-30 nm. CTABr still remains in the material as impurities. Meanwhile, based on morphological analysis, Cu particles are dissipated in the pore of thin film. Graphite/TiO~Cuhas higher photoconversionefficiency than graphite/Ti02. Keywords: semiconductor, graphite/Ti02> Cu electrodeposition