Understanding ALD, MLD and SAMs as they enter the fab
| Main Authors: | Arkles, Barry, Goff, Jonathan, Kaloyeros, Alain |
|---|---|
| Format: | Article eJournal |
| Bahasa: | eng |
| Terbitan: |
, 2018
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| Subjects: | |
| Online Access: |
https://zenodo.org/record/3749795 |
Daftar Isi:
- As the world of advanced manufacturing enters the sub-nanometer scale era, it is clear that ALD, MLD and SAM represent viable options for delivering the required few-atoms-thick layers required with uniformity, confor- mality, and purity. By delivering the constituents of the material systems individually and sequentially into the processing environment, and precisely controlling the resulting chemical reactions with the substrate surface, these techniques enable excellent command of processing parameters and superb management of the target specifications of the resulting films.