Process for thin film deposition through controlled formation of vapor phase transient species US Pat. 11,248,291
| Main Authors: | Arkles, Barry C., Kaloyeros, Alain E. |
|---|---|
| Format: | info publication-patent Journal |
| Bahasa: | eng |
| Terbitan: |
, 2022
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| Subjects: | |
| Online Access: |
https://zenodo.org/record/6099704 |
Daftar Isi:
- A method for deposition of a thin film onto a substrate is provided. The method includes providing a source precursor containing on or more of elements constituting the thin film, generating a transient species from the source precursor, and depositing a thin film onto the substrate from the transient species. The transient species being a reactive intermediate that has a limited lifetime in a condensed phase at or above room temperature.