Impact of Threshold Voltage roll off in Ultra Thin Fully Depleted Silicon on Insulator MOSFET
| Main Authors: | Chandra Shakher Tyagi, R.L. Sharma, Prashant Mani |
|---|---|
| Other Authors: | Blue Eyes Intelligence Engineering & Sciences Publication (BEIESP) |
| Format: | Article Journal |
| Bahasa: | eng |
| Terbitan: |
, 2020
|
| Subjects: | |
| Online Access: |
https://zenodo.org/record/5575178 |
Daftar Isi:
- This article is discussing about threshold voltage roll off effect in Ultra Thin Fully Depleted Silicon on Insulator MOSFET. The device performance is improved due to the reduction in threshold voltage roll off. The thickness of oxide layer is optimized to 2nm which also have a vital role in improvement of device’s throughput. The effect of oxide thickness on parasitic parameter also discussed. Device conductance and transconductance also take in account on simulating the ultra thin fully depleted SOIMOSFET.