Process for pulsed thin film deposition
| Main Authors: | Arkles, Barry, Kaloyeros, Alain E. |
|---|---|
| Format: | info publication-patent Journal |
| Bahasa: | eng |
| Terbitan: |
, 2021
|
| Subjects: | |
| Online Access: |
https://zenodo.org/record/4651373 |
Daftar Isi:
- A thin film deposition process is provided. The process includes, in a single cycle, providing a precursor in the vapor phase with or without a carrier gas to a reaction zone containing a substrate, such that a monolayer of the precursor is adsorbed to a surface of the substrate and the adsorbed monolayer subsequently undergoes conversion to a discrete atomic or molecular layer of a thin film, without any intervening pulse of or exposure to other chemical species or co-reactants.