Wet Etching on GaAs Wafer using low cost UV system
| Main Authors: | M. A. ZAMAN, M Abul Hossion, Mahbubul Hoq, Md. Nasrul Haque Mia |
|---|---|
| Format: | Article |
| Terbitan: |
, 2014
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| Subjects: | |
| Online Access: |
https://zenodo.org/record/4028073 |
Daftar Isi:
- The study involves the cleaning, wet etching and characterization of GaAs wafer in the first semiconductor device fabrication Laboratory at the Institute of Electronics, Atomic Energy Research Establishment, Savar, Dhaka, Bangladesh during the year 2011. The primary step is to develop necessary photolithography skill in 100 class clean room with Cole-Parmer 365nmUV illumination and thoroughly characterize equipment needed to perform photolithography including Hot plate, Spinner. Here, the studies are extended to photo resist thickness measurements using surface profiler and SEM to view etched surface quality. The experiences and the results of this study will benefit the students who are interested in the semiconductor fabrication field in Bangladesh.