Resist and Transfer Free Patterned CVD Graphene Growth on ALD Molybdenum Carbide Nano Layers
| Main Authors: | Grady, Eldad, Li, Chenhui, Raz, Oded, Kessels, W.M.M., Bol, Ageeth A. |
|---|---|
| Format: | info publication-preprint Journal |
| Terbitan: |
, 2019
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| Online Access: |
https://zenodo.org/record/3542084 |
Daftar Isi:
- Multilayer graphene (MLG) films were grown chemical vapour deposition (CVD) on molybdenum carbide (MoCx) substrates. We fabricated the catalytic MoCx films by plasma enhanced atomic layer deposition. The mechanism of graphene growth is studied and analysed for amorphous and crystalline MoCx films. In addition, we present a complete bottom up patterned graphene growth (GG) on pre-patterned MoCx ALD. Selective CVD GG eliminates the need to pattern the graphene film by damaging photolithography processes, ion beam milling and coating the graphene with photoresists. Furthermore, we fabricated MLG directly on 100 nm suspended SiN membrane. We demonstrate these qualities with characterisation of the MLG using Raman spectroscopy, and scanning electron microscopy (SEM). The techniques of graphene device manufacturing demonstrated here bring the mass scale graphene device fabrication possibilities closer than before.
- Draft version of paper. References will be added, some plots will be modified later.