THE EFFECT OF KCl PLATING BATH TEMPERATURE ON THE REFLECTANCE OF Cu/Ag
| Main Author: | Toifur, Moh. |
|---|---|
| Format: | Article PeerReviewed Book |
| Bahasa: | eng |
| Terbitan: |
National Nuclear Energy Agency (BATAN) Agency of Assessment and Application of Technology (BPPT)
, 2007
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| Subjects: | |
| Online Access: |
http://eprints.uad.ac.id/18591/1/cssi%20serpong%202007.pdf http://eprints.uad.ac.id/18591/ |
Daftar Isi:
- THE EFFECT OF KCl PLATING BATH TEMPERATURE ON THE REFLECTANCE OF Cu/Ag. Deposition of Ag on the Cu substrate has been done at the various plating bath temperature to obtain the optimum temperature of plating bath that can produce the highest reflectance coefficient. KCl which is used as plating bath was set at various temperatures from 60 up to 90 °C. Electrolysis process was supplied with 5 volt DC voltage during 7 minutes deposition. Many characterizations were done including the ordering of crystalline structure, sheet resistivity and reflectance, each of these was done by XRD, four point probe and UV-vis spectrometer from 390 up to 790Å wave length. The result shows that the optimum plating bath temperature for producing the highest quality Ag film was 80°C which has the highest ordering crystalline structure, sheet resistivity of 0.52 ohm/sq and reflectance coefficient of 98%. Key words : Plating bath temperature, reflectance