Lokasi: Optimization of Deposition Parameters for high Quality a-SiGe:H Thin Films

Main Authors:	Mursal Mursal; Department of Physics, Universitas Syiah Kuala, Banda Aceh, Ida Usman; Department of Physics, Universitas Haluoleo, Kendari, Toto Winata; Research Group on Electronic Material Physics, Faculty of Mathematics and Natural Sciences, Bandung Institute of Technology, Sukirno Sukirno; Research Group on Electronic Material Physics, Faculty of Mathematics and Natural Sciences, Bandung Institute of Technology, Mohamad Barmawi; Research Group on Electronic Material Physics, Faculty of Mathematics and Natural Sciences, Bandung Institute of Technology
Format:	Article application/pdf eJournal
Bahasa:	eng
Terbitan:	Institut Teknologi Bandung , 2009
Subjects:	A-SiGe:H Optical band gap Photosensitivity PECVD
Online Access:	http://journal.fmipa.itb.ac.id/jms/article/view/121

Koleksi	Jurnal Matematika & Sains
Gedung	Perpustakaan Institut Teknologi Bandung
Institusi	Institut Teknologi Bandung
Kota	KOTA BANDUNG
Provinsi	JAWA BARAT
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