Indonesia OneSearch
Gravitasi
  • Cari
  • MODELING OF REDISTRIBUTION OF...
  • Lokasi
Cover Image

MODELING OF REDISTRIBUTION OF INFUSED DOPANT IN A MULTILAYER STRUCTURE DOPANT UNDER INFLUENCE OF VARIATION OF PRESSURE OF VAPOR OF THE DOPANT

Tersimpan di:
Main Authors: E.L. Pankratov, E.A. Bulaeva
Format: Article
Terbitan: , 2020
Subjects:
Dopant diffusion
multilayer structure
p-n-heterojunctions
optimization of technological process
influence of pressure of vapor
Online Access: https://zenodo.org/record/3676668
  • Lokasi
  • Deskripsi
  • Daftar Isi
  • Preview
  • Tampilan Petugas

Internet

https://zenodo.org/record/3676668

Lihat Juga

  • ON APPROACH OF OPTIMIZATION OF FORMATION OF INHOMOGENOUS DISTRIBUTIONS OF DOPANT IN A FIELD-EFFECT HETEROTRANSISTORS
    oleh: E.L. Pankratov, et al.
    Terbitan: (2015)
  • OPTIMIZATION OF DOPANT DIFFUSION AND ION IMPLANTATION TO INCREASE INTEGRATION RATE OF FIELD-EFFECT HETEROTRANSISTORS. AN AP PROACH TO SIMPLIFY CONSTRUCTION OF THE HETEROTRANSISTORS
    oleh: E.L. Pankratov, E.A. Bulaeva
    Terbitan: (2015)
  • ON APPROACH TO ANALYZE NONLINEAR MODEL OF MASS AND HEAT TRANSPORT DURING GAS PHASE EPITAXY. A POSSIBILITY TO IMPROVE PROPERTIES OF FILMS
    oleh: E.L. Pankratov, et al.
    Terbitan: (2017)
  • INFLUENCE OF OVERLAYERS ON DEPTH OF IMPLANTED-HETEROJUNCTION RECTIFIERS
    oleh: E.L. Pankratov1 , E.A. Bulaeva
    Terbitan: (2018)
  • On Optimization of Doping of a Hetero structure During Manufacturing of P-I-N-Diodes
    oleh: E.L. Pankratov, et al.
    Terbitan: (2018)
© 2025 Perpustakaan Nasional Republik Indonesia
Loading...