Effect of Substrate Temperature and Target-Substrate Distance on Growth of TiO2 Thin Films by Using DC- Reactive Sputtering Technique
Main Authors: | Rabih, Laith; Mosul University, AL-majmoaa St., Mosul, Iraq, -, Sudjatmoko; Centre for Accelerator and Material Process Technology, BATAN, Jl. Babarsari Kotak Pos 6101 YKBB Yogyakarta 55281, Indonesia, Triyana, Kuwat; Department of Physics, Gadjah Mada University, Sekip Utara BLS.21 Yogyakarta 55281, Indonesia, Nurwantoro, Pekik; Department of Physics, Gadjah Mada University, Sekip Utara BLS.21 Yogyakarta 55281, Indonesia |
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Format: | Article info application/pdf eJournal |
Bahasa: | eng |
Terbitan: |
Jurusan Fisika, Fakultas MIPA, Universitas Gadjah Mada
, 2014
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Online Access: |
http://pdm-mipa.ugm.ac.id/ojs/index.php/jfi/article/view/829 http://pdm-mipa.ugm.ac.id/ojs/index.php/jfi/article/view/829/908 |
Internet
http://pdm-mipa.ugm.ac.id/ojs/index.php/jfi/article/view/829http://pdm-mipa.ugm.ac.id/ojs/index.php/jfi/article/view/829/908
Lokasi
Koleksi | Jurnal Fisika Indonesia |
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Gedung | Perpustakaan Pusat Universitas Gadjah Mada |
Institusi | Universitas Gadjah Mada |
Kota | SLEMAN |
Provinsi | DAERAH ISTIMEWA YOGYAKARTA |
Kontak | Butuh informasi lebih lanjut? Hubungi pustakawan institusi ini. |